http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100591863-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1996-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100591863-B1 |
| titleOfInvention | Positive resist composition |
| abstract | Positive resist composition comprising a quinonediazide compound (A), an alkali-soluble resin (B) and a solvent system (C) comprising 2-heptanone, ethyl lactate and γ-butycollactone, wherein quinonedia Gide compounds have very good solubility), which is characterized by very good photosensitivity, profile and coating properties. |
| priorityDate | 1995-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 149.