http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100586543-B1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-36
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 2003-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2006-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100586543-B1
titleOfInvention Organic antireflection film polymer, preparation method thereof and antireflection film composition containing the same
abstract The present invention relates to an organic antireflection film polymer used in an ultrafine pattern forming process of a photoresist, a method for preparing the same, and an antireflection film composition containing the same, wherein the antireflection film is overcoated on top of the photoresist to minimize reflectance on the top of the photoresist. The present invention relates to an organic antireflection film polymer, a method for manufacturing the same, and an antireflection film composition containing the same, which can prevent the photoresist pattern from collapsing due to diffuse reflection. Such an organic antireflection film polymer of the present invention has a structure represented by the following Chemical Formula 1.n n n [Formula 1]n n n n n n n n In the above formula, a, b, c are mole fractions of each monomer, b represents 0.01 to 0.1, and a, c represents 0.1 to 0.9, respectively.n n n n Organic antireflection film, overcoating, reflectivity, refractive index, water soluble
priorityDate 2003-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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