| abstract |
The present invention relates to an organic anti-reflective coating composition capable of preventing reflection in a lower layer of a photoresist film in a process of forming an ultra-fine pattern during a semiconductor manufacturing process, a method of manufacturing the same, and a method of forming an organic anti-reflective coating pattern using the composition The composition according to the present invention is prepared by using a compound having a structure of Formula 13 as a crosslinking agent and a compound having a structure of Formula 14 as a light absorbing agent. The compound prepared as described above and the organic anti-reflective coating composition including the same have excellent absorption of far ultraviolet rays, not only can significantly reduce the sine wave effect, but also have a very excellent pattern shape, thereby contributing to higher integration of semiconductors. have.n n n n n n n n n n n n n n n n n B: c in the formula is 0.1 to 1.0: 0.1 to 1.0,n n n R 'and R "are each hydrogen or a methyl group,n n n R 1 , R 2 and R 4 are branched or main chain substituted alkyl groups having 1 to 5 carbon atoms, and R 3 is branched or main chain substituted alkyl groups having 0 to 5 carbon atoms. |