http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100571313-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1999-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100571313-B1 |
| titleOfInvention | Positive photosensitive composition |
| abstract | The present invention comprises at least one of (a) a basic nitrogen-containing compound having a polycyclic structure represented by formula (I), and (b) a compound represented by formulas (II) to (IV) as defined in the specification. A positive photosensitive composition is provided:n n n n n n n n Here, Y and Z may be same or different, and each represents a linear, branched, or cyclic alkylene group which may contain a hetero atom or may have a substituent. This positive photosensitive composition is not deteriorated in sensitivity and exhibits no T-top deformation of the resist surface shape over time between the width reduction of the resist pattern or the post-exposure heat treatment. |
| priorityDate | 1998-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 246.