http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100567962-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00 |
| filingDate | 1999-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100567962-B1 |
| titleOfInvention | Polishing Compositions and Surface Treatment Compositions |
| abstract | The present invention uses a composition containing water, an abrasive and at least one compound selected from the group consisting of hydroxides of alkali metals, carbonates of alkali metals, hydrogencarbonates of alkali metals, quaternary ammonium salts, peroxides and peroxoic acid compounds as additives. And a method of polishing a silicon wafer having a resistivity of 0.1 Pa ยท cm or less. |
| priorityDate | 1998-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 70.