http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100563425-B1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S117-906
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T117-1032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S117-90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S117-907
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-208
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B27-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-00
filingDate 1997-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2006-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100563425-B1
titleOfInvention Process and apparatus for controlling the oxygen content in silicon wafers heavily doped with antimony or arsenic
abstract The present invention relates to a method and apparatus for controlling the concentration and distribution of oxygen in a single crystal silicon rod extracted from an antimony or arsenic selectively doped silicon melt, according to the Czochralski method in which the gas atmosphere is maintained on top of the melt. In one embodiment of the method, the gas pressure of the gaseous atmosphere above the melt is gradually increased to a value above 100 Torr as the portion of the solidified silicon melt increases. In subsequent embodiments of the method, the gas pressure of the gas atmosphere on top of the melt is maintained at or near a constant value above 100 Torr. The method and apparatus are even more characteristic in that a controlled flow of inert gas is used to remove vapors and particulates from the rods and melts, resulting in zero dislocations single crystal silicon rods.
priorityDate 1996-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5354495
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID161104
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419549163
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359596
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453095146
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419586572
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123

Total number of triples: 29.