http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100557543-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D295-185 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 |
| filingDate | 2000-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100557543-B1 |
| titleOfInvention | Novel photoresist monomers, polymers thereof and photoresist compositions containing them |
| abstract | The present invention relates to a novel photoresist monomer, a polymer thereof, and a photoresist composition containing the polymer, wherein the photoresist monomer of Formula 1 and the polymer thereof have excellent adhesion to a substrate, and have excellent contrast ratio and sensitivity. Since the photoresist composition of the present invention can be suitably used for forming a fine pattern in the far ultraviolet region.n n n [Formula 1]n n n n n n n n Wheren n n R 1 is H or CH 3 ;n n n R 4 , R 5 , R 6 and R 7 are each H; OH; Substituted or unsubstituted C 1 -C 10 straight or branched alkyl; Or substituted or unsubstituted C 1 -C 10 straight or branched chain alkyl comprising an ether group (—O—);n n n n is an integer selected from 0-5. |
| priorityDate | 2000-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 106.