http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100553916-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100553916-B1 |
| titleOfInvention | Resist composition comprising a polymer having a suspending group containing a plurality of acid labile moieties |
| abstract | Acid-catalyzed positive resist compositions that are imageable with 193 nm radiation and / or possibly other radiation, and that are developable to form improved development properties and improved etch resistant resist structures, include a suspension containing a plurality of acid labile moieties. It is possible by using a resist composition containing an imaging polymer having a monomer to make. Preferred suspensions containing a plurality of acid labile moieties are characterized by the presence of bulk end groups. |
| priorityDate | 2001-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 66.