http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100541885-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-02 |
| filingDate | 2002-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100541885-B1 |
| titleOfInvention | Base material for abrasive cloth |
| abstract | Disclosed is a substrate for polishing cloth, in which adhesion to an abrasive material is greatly increased. The substrate for abrasive cloth includes a yarn selected from cotton yarn, synthetic fiber yarn, blended fiber yarn, spun yarn, open end yarn or filament yarn, and the yarn is woven into a woven fabric with a larger number of weft yarns than the number of warp yarns. The present invention relates to a base material type abrasive cloth.n n n Abrasive cloth base, main fabric |
| priorityDate | 2002-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.