http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100538501-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-42 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-71 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-71 |
| filingDate | 2000-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100538501-B1 |
| titleOfInvention | Novel Onium Salts, Photoacid Generators for Resist Compositions, Resist Compositions and Patterning Process |
| abstract | The present invention provides an onium salt represented by the following formula (1). The chemically amplified resist material using the onium salt of the present invention has excellent resolution and focus margin by containing sulfonic acid ester groups in the molecule, and has a low line width variation and shape deterioration even when PED is applied for a long time. Thereafter, there is little foreign matter after peeling, it is excellent in the pattern profile shape after image development, has high resolution suitable for microfabrication, and shows the great power especially in far ultraviolet lithography.n n n n n n n n n n Wherein R 1 represents a straight, branched or cyclic substituted or unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted or unsubstituted aryl group having 6 to 14 carbon atoms, R 2 may be the same or different, and hydrogen A linear or branched or cyclic substituted or unsubstituted alkyl group having 1 to 6 atoms or carbon atoms, p is an integer of 1 to 5, q is an integer of 0 to 4, p + q = 5, R 3 May be the same or different and represents a straight, branched or cyclic substituted or unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted or unsubstituted aryl group having 6 to 14 carbon atoms, and M represents a sulfur atom or an iodine atom A is 3 when M is a sulfur atom and a is 2 when M is an iodine atom. |
| priorityDate | 1999-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 861.