| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F291-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-062 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate |
2002-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2005-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100537362-B1 |
| titleOfInvention |
Composition for actinic energy ray and method of forming pattern |
| abstract |
Active energy ray containing a specific vinyl ether group-containing compound (A), a carboxyl group and / or a polymer containing a hydroxyphenyl group (B) and a photoacid generator (C), in which a vinyl ether group is bonded to secondary or tertiary carbon. A composition can form the resist pattern excellent in resolution, without heating at the temperature of 60 degreeC or more after exposure. |
| priorityDate |
2001-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |