http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100535222-B1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate | 2004-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2005-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22772d8958762c47aede5803b0279630 |
publicationDate | 2005-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100535222-B1 |
titleOfInvention | Composition for anti-reflective coating material |
abstract | The composition for an antireflective coating material comprises a polymer compound having a repeating unit having a specific structure, and melamine, guanamine, urea and phenol in which two or more positions are optionally substituted by at least one group selected from the group consisting of a metyrol group or an alkoxymethyl group. , Naphthol or hydroxyanthracene. The antireflective coating material composition of the present invention is effective in reducing the adverse effect of reflection by the substrate in the lithography process using various radiations. A method of forming a resist pattern comprising the use of a composition for an antireflective coating material is disclosed. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102163855-B1 |
priorityDate | 1996-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 458.