http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100532590-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S525-928 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1014 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100532590-B1 |
| titleOfInvention | Soluble Polyimide for photosensitive polyimide and photosensitive polyimide composition comprising the soluble polyimide |
| abstract | The present invention relates to a soluble polyimide for a photosensitive polyimide precursor and a photosensitive polyimide precursor composition comprising the same. More specifically, the present invention relates to a soluble polyimide comprising a hydroxyl group and an acetal group in a side chain and a reactive blocking group at one or both ends thereof. And a photosensitive polyimide precursor composition comprising the soluble polyimide, a polyamic acid including a reactive blocking group at one or both ends, a photo acid generator (PAG), and a dissolution inhibitor as necessary. It is about.n n n Soluble polyimide according to the present invention has a large change in solubility in aqueous alkali solution in the presence of acid, can yield a very flat film upon coating, and crosslinking between polymers is formed upon thermal curing leading to the presence of terminal reactive blockers. As can be used, it can be used for photosensitive polyimide. In the case of the photosensitive polyimide precursor composition according to the present invention, the flatness during coating is excellent, and the difference in the dissolution rate between the exposed portion and the non-exposed portion is large, so that a high resolution pattern can be obtained with a small amount of a photosensitive agent as well as a thick polyimide. The layer can be produced, the film shrinkage rate of the film is low in the subsequent curing step, and the obtained polyimide film has excellent physical properties. |
| priorityDate | 2002-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 142.