http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100528270-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1997-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100528270-B1 |
| titleOfInvention | Positive resist composition |
| abstract | The present invention converts from alkali insoluble or alkali poor solubility to alkali solubility by the action of acid, which is not only excellent in various properties such as sensitivity, resolution, heat resistance, film holding ratio, applicability and profile, but also excellent in suppressing the time delay effect. It relates to a chemically amplified positive photoresist composition comprising a tertiary amine compound (C) having a resin (A), an acid generator (B) and an aliphatic hydroxyl group. |
| priorityDate | 1996-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 143.