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filingDate 2001-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2005-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100526915-B1
titleOfInvention Aqueous dispersions, process for their production, and method for the chemical-mechanical polishing of substrate using the same
abstract The present invention comprises an aqueous dispersion containing cerium oxide doped pyrolysis silicon dioxide, cerium oxide being introduced via an aerosol of cerium salt solution or cerium salt suspension, and having an average particle size of cerium oxide doped pyrolysis silicon dioxide less than 100 nm. to provide. The dispersion is prepared by dispersing cerium oxide doped pyrolysis silicon dioxide in an aqueous solution by high energy input. Such aqueous dispersions can be used for chemical mechanical polishing.
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