http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100512171-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2003-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100512171-B1 |
| titleOfInvention | Compositon for a bottom layer resist |
| abstract | The present invention provides a novel lower layer resist composition having excellent antireflection function and resistance to dry etching in a two layer resist process using a wavelength of 193 nm. This lower layer resist composition contains a polymer represented by the following formula (1).n n n <Formula 1>n n n n n n n n In Formula 1, R is a hydrogen or methyl group, m / (m + n) = 0.5 ~ 1.0 and n / (m + n) = 0 ~ 0.5. |
| priorityDate | 2003-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.