http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100510021-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100510021-B1 |
| titleOfInvention | Positive-working photoresist composition |
| abstract | In the non-exposure region to patterned exposure, it is used in the photolithographic patterning operation of semiconductor device manufacturing, which can generate an excellent patterned resist layer having a remarkably small film thickness reduction by developing a water-soluble alkaline developer. A novel positive chemically amplified photoresist composition is provided. Characteristically, the resin component of the composition formed by the combination of a radiation sensitive acid generator and endowed with an increase in solubility in an alkali developing solution has a specific molar fraction of (a) hydroxystyrene units, (b) styrene units and (c). It is a terpolymer copolymer comprised from the monomeric unit of the 1-alkylcyclohexyl (meth) acrylate unit. |
| priorityDate | 1999-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.