http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100505635-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F234-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F234-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2002-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100505635-B1 |
| titleOfInvention | Polymer having butadiene sulfone repeating unit and resist composition comprising the same |
| abstract | Disclosed are a polymer having a repeating unit consisting of a copolymer of butadiene sulfone and maleic anydride, and a chemically amplified resist composition comprising the same. The resist composition according to the present invention comprises a photosensitive polymer comprising a first repeating unit made of a copolymer of butadiene sulfone and maleic anhydride having the following structure, and a second repeating unit copolymerized with the first repeating unit. |
| priorityDate | 2002-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 81.