http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100504706-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 1998-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2006-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2006-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100504706-B1 |
titleOfInvention | Positive resist composition and pattern formation method using the same |
abstract | The present invention provides a positive photoresist composition having excellent properties such as sensitivity, resolution, pattern profile, dimensional stability, and the like, with high precision and focus tolerance, for use of short wavelength light sources such as far ultraviolet light and excimer laser light.n n n (A) A resin containing both a repeating structural unit protected by an acetal group and (2) a repeating structural unit protected by an acid-decomposable group, and (2) a repeating structural unit protected by an alkoxycarbonyloxy group or an alkoxycarbonylmethoxy group. A positive resist composition comprising a triphenylsulfonium salt or diphenyl iodonium salt having a structure. |
priorityDate | 1997-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 405.