| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-087
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-383
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-38 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-087
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J27-132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-383
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07B61-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J37-26 |
| filingDate |
2001-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100502996-B1 |
| titleOfInvention |
Production and use of octafluoropropane |
| abstract |
(1) reacting hexafluoropropene and hydrogen fluoride in a gas phase in the presence of a fluorination catalyst at a temperature of 150 to 450 ° C. to obtain 2H-heptafluoropropane; and (2) 2H obtained in step (1). Octafluoropropane is prepared by a method comprising reacting heptafluoropropane with fluorine gas in a gaseous phase at a temperature of 250 to 500 ° C. to obtain octafluoropropane. The high-purity octafluoropropane used in the manufacturing process of the semiconductor device is obtained. |
| priorityDate |
2000-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |