http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100501600-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100501600-B1 |
| titleOfInvention | Polymer, Resist Composition and Patterning Process |
| abstract | The present invention relates to a polymer compound having a weight average molecular weight of 1,000 to 500,000 having a unit represented by the following formula (1) or (2).n n n n n n n n n n n n n n n n n In formula, R < 1> represents an acid labile group, R < 2> represents a hydrogen atom or a C1-C4 linear or branched alkyl group, Z represents a C2-C10 tetravalent hydrocarbon group, k is 0 or 1 to be.n n n In addition, the resist material of the present invention is useful for microfabrication by electron beams or far ultraviolet rays because it is sensitive to high energy rays and excellent in sensitivity, resolution, and etching resistance. In particular, since absorption in the exposure wavelength of ArF excimer laser and KrF excimer laser is small, it has a characteristic that the pattern which is fine and perpendicular | vertical with respect to a board | substrate can be formed easily. |
| priorityDate | 1999-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 466.