http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100499869-B1

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filingDate 1999-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100499869-B1
titleOfInvention Novel photoresist crosslinker and photoresist composition using the same
abstract The present invention relates to a novel crosslinking monomer for a negative photoresist (Formula 1), a polymer thereof and a photoresist composition using the same, which can be used in the far ultraviolet region. In particular, the crosslinking agent of the present invention is a chemically amplified crosslinking agent composed of a polymer. As a result, the crosslinking density is very large, which is useful for preparing ArF (193 nm) or EUV photoresist requiring light sensitivity.n n n <Formula 1>n n n n n n n n Wherein R1 and R2 each represent a C1-10 main chain or branched chain substituted alkyl, a C1-10 branched or main chain substituted ester, a C1-10 chain or side chain substituted ketone, a C1-10 Side-chain or main-chain substituted carboxylic acids between, side-chain or main-chain substituted acetals having 1 to 10 carbon atoms, side-chain or main-chain substituted alkyl having one or more hydroxyl groups (-OH), one Branched or backbone substituted esters having 1 to 10 carbon atoms containing at least one hydroxyl group (—OH), branched or backbone substituted ketones having 1 to 10 carbon atoms containing at least one hydroxyl group (—OH), one Branched or main chain substituted carboxylic acids having 1 to 10 carbon atoms containing at least one hydroxyl group (—OH) and having 1 to 10 carbon atoms containing at least one hydroxyl group (—OH) Side chain or main chain substituted acetal and the like, and R 3 is hydrogen or methyl, respectively.
priorityDate 1999-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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