http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100498877-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
filingDate | 1997-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2005-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2005-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100498877-B1 |
titleOfInvention | Anti-reflective Coating Materials |
abstract | The composition for an antireflective coating material comprises a polymer compound having a repeating unit having a specific structure, and melamine, guanamine, urea and phenol in which two or more positions are optionally substituted by at least one group selected from the group consisting of a metyrol group or an alkoxymethyl group. , Naphthol or hydroxyanthracene. The composition for antireflection film materials of the present invention is effective in reducing the adverse effect of reflection by a substrate in the lithography process using various radiations. A method of forming a resist pattern comprising the use of a composition for an antireflective coating material is disclosed. |
priorityDate | 1996-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 463.