http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100498626-B1

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filingDate 2002-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2005-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100498626-B1
titleOfInvention Substrate Cleaning Apparatus and Substrate Cleaning Method
abstract The soft spray nozzle which discharges a cleaning mist is fixed to the arm facing a perpendicular direction. On the other hand, the rinse nozzle which discharges the rinse pure water for suppressing the obstacle is fixedly installed in the arm toward the vertical direction at a predetermined distance from the soft spray nozzle. During the cleaning process, both nozzles maintain a relative arrangement or discharge the cleaning liquid. Therefore, the discharged cleaning mist and the rinse pure water do not interfere with each other before they land on the substrate, and all of the used cleaning liquid is recovered in a cup flying in the horizontal direction. This prevents the cleaning mist from scattering and adhering to the surroundings.
priorityDate 2001-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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