http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100496174-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 1998-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100496174-B1 |
| titleOfInvention | Positive Photosensitive Composition |
| abstract | If the positive photosensitive composition has high photosensitivity, an excellent resist pattern can be provided and there is little change in line width after exposure. Positive photosensitive compositions are represented by the general formulas (Ia) or (Ib), which can generate sulfonic acids by irradiation with actinic rays or radiation and resins having groups which can be decomposed by the action of an acid to increase resin solubility in alkaline developing solutions. It includes a compound which becomes.n n n n n n n n Wherein R 1 to R 3 represent a group represented by -SR 4 , wherein a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or R 4 is an alkyl group or an aryl group; X − represents a specific anion of benzenesulfonic acid, naphthalenesulfonic acid or anthracenesulfonic acid; 1, m, and n represent the integer of 1-3. |
| priorityDate | 1997-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 371.