| abstract |
A photosensitive polymer comprising a hydroxy alkyl vinyl ether monomer and a resist composition comprising the same are disclosed. The photosensitive polymer which concerns on this invention is a photosensitive polymer whose mass mean molecular weight contains 3,000-50,000 containing the alkyl vinyl ether monomer represented by a following formula.n n n n n n n n In the formula, x is an integer in the range of 3 ~ 6, R 1 and R 2 is a perfluorinated alkyl group of C 1 ~ C 20 alkyl group, C 1 ~ C 10 fluoroalkyl group, or C 1 ~ C 10 of each. |