http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100491140-B1

Outgoing Links

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filingDate 2001-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2005-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100491140-B1
titleOfInvention Method and apparatus for removing contaminants from the surface of a substrate with atmospheric-pressure plasma
abstract The present invention relates to a method and apparatus for using atmospheric plasma for surface cleaning of various materials. In the present invention, the plasma generated by the silent discharge method is used to lead out of the discharge space by using a flow of rapid airflow. That is, if one side of the space between the positive electrode, which is the plasma generating space, is used as the inlet for the gas used for discharge, and the other side is the outlet, the directional air flow is applied, the plasma in the discharge space is ejected toward the outlet, and thus the Cleaning of the sample surface located on the outlet side can be performed. Moving the sample relative to the atmospheric plasma generator according to the present invention can obtain the effect of continuously cleaning the surface of the sample. In this manner, the sample can be continuously moved to the sample moving under atmospheric pressure or by the moving atmospheric plasma generator. Cleaning process is possible.
priorityDate 2001-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.