| abstract |
Copolymers of acrylate monomers containing fluorine in the α-position with fluorine-containing hydroxystyrene derivatives are highly transparent to VUV radiation and resistant to plasma etching. The resist composition using this polymer compound as the base resin is sensitive to high energy rays of 200 nm or less, has excellent sensitivity, resolution, transparency, substrate adhesion, and plasma etching resistance, and is suitable for lithography fine processing. |