http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100476136-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32825 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| filingDate | 2002-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100476136-B1 |
| titleOfInvention | Apparatus for treating the surface of a substrate with atmospheric pressure plasma |
| abstract | A surface treatment apparatus using an atmospheric plasma is provided. The surface treatment apparatus includes a process gas storage unit and a plasma generation unit located below the process gas storage unit, a) the process gas storage unit includes a first inlet for introducing the process gas into the process gas storage unit, b) The plasma generating unit includes an upper electrode and a lower electrode facing each other, a plasma generating space formed between the two electrodes, an insulator for insulating the upper electrode and the lower electrode, a radiator for lowering the surface temperature of the electrode, and processing gas from the processing gas storage unit. A second inlet to be introduced into the generating space, a plasma generated in the plasma generating space and an outlet to guide the processing gas not converted into the plasma to the outside of the plasma generating space, and an AC power source applying an AC voltage, wherein the upper portion Both the electrode and the lower electrode are flat electrode, and the outlet port is It is formed on the pole, characterized in that the substrate is located below the lower electrode. Regardless of the type of substrate to be treated, the surface treatment apparatus described above can increase the treatment area of the substrate and enable continuous surface treatment of the substrate under atmospheric pressure. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023085579-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101333878-B1 |
| priorityDate | 2002-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.