http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100475083-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100475083-B1 |
| titleOfInvention | Photomask for forming small contact holes array, method for fabricating the same and method for using the same |
| abstract | A photomask, a method of manufacturing the same, and a method of using the same for forming a fine contact hole array are disclosed. The photomask according to the present invention includes a plurality of line type light blocking patterns formed on a transparent substrate, a transparent substrate to define a light transmitting portion for pattern formation, and a phase periodically arranged on a transparent substrate between the light blocking patterns to define a contact hole light transmitting portion. It includes an inversion area. The use of the photomask according to the invention with customized illumination facilitates the formation of fine and dense contact hole arrays. Fine contact holes having good quality can be formed immediately in the photoresist without requiring any additional step or treatment in the additional step. |
| priorityDate | 2002-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.