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filingDate 2002-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2005-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100474845-B1
titleOfInvention Tin oxide powder, manufacturing method thereof, and manufacturing method of high density indium tin oxide target using the same
abstract This application is the measured surface area by the BET method 4 ~ 15m 2 / g and, BET method SnO 2 Preparation of powder and SnO 2 powder capable of easily manufacturing the same, characterized in that the measured particle size of 50 ~ 200nm to The method is disclosed. By using SnO 2 powder obtained by the present invention, it is possible to obtain a high density ITO target that can be used to manufacture high quality transparent electrodes of display devices such as LCD, EL, FED devices and the like.
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