http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100450221-B1

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filingDate 2001-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2004-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100450221-B1
titleOfInvention THE METHOD OF MANUFACTRING SINGLE CRYSTAL GaN SUBSTRATE AND SINGLE CRYSTAL GaN SUBSTRATE
abstract The present invention provides a GaN substrate manufacturing method and a GaN substrate having a small penetration potential and no dislocation bundles on the surface of the substrate and causing no cleavage of the cleaved surface. In the means, the GaN single crystal ingot is sliced in a plane parallel to the growth direction to form a substrate. The dislocation travels parallel to the surface, resulting in a low dislocation density. It is also characterized by growing GaN as seed crystals.
priorityDate 2000-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 31.