Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-406 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02433 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02546 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02389 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0254 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-323 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-38 |
filingDate |
2001-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2004-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2004-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-100450221-B1 |
titleOfInvention |
THE METHOD OF MANUFACTRING SINGLE CRYSTAL GaN SUBSTRATE AND SINGLE CRYSTAL GaN SUBSTRATE |
abstract |
The present invention provides a GaN substrate manufacturing method and a GaN substrate having a small penetration potential and no dislocation bundles on the surface of the substrate and causing no cleavage of the cleaved surface. In the means, the GaN single crystal ingot is sliced in a plane parallel to the growth direction to form a substrate. The dislocation travels parallel to the surface, resulting in a low dislocation density. It is also characterized by growing GaN as seed crystals. |
priorityDate |
2000-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |