| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-42 |
| filingDate |
2001-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2004-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100442865-B1 |
| titleOfInvention |
Photosensitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same |
| abstract |
A photosensitive polymer having a fluorinated ethylene glycol group and a chemically amplified resist composition comprising the same are disclosed. The photosensitive polymer according to the present invention has a weight average molecular weight of 3,000 to 50,000 and includes a repeating unit of the following structure.n n n n n n n n Wherein R 1 is a hydrogen atom or a methyl group, and R 2 is a C 3 to C 10 hydrocarbon group having a fluorinated ethylene glycol form. |
| priorityDate |
2001-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |