http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100442653-B1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D311-56 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D311-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D335-06 |
filingDate | 1998-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2004-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2004-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100442653-B1 |
titleOfInvention | Process for preparing coumarin sulfonates |
abstract | The present invention relates to benzo-heterocyclic diazo dike, such as substituted diazo-4-oxo-3,4-dihydrocoumarin, which is a synthetic intermediate useful in a variety of applications including photoresist, optoelectronics, agriculture and pharmacy. A novel process for preparing sulfonic acid esters and amides of earth compounds. The method comprises the steps of (a) treating a substituted benzo-heterocyclic β-keto-enol compound in the presence of a diazo transfer agent with suitable diazo transfer conditions; (b) treating said diazo diketo compound with suitable halosulfonation conditions in the presence of a halosulfonation agent; And (c) subjecting the halosulfonyl aromatic compound formed in the above step in the presence of an alcohol or an amine to a suitable substitution reaction to form the corresponding sulfonic acid ester or amide of the benzo-heterocyclic diazo diketo compound. do. Compounds formed from the process of the present invention exhibit very high photosensitivity in the extreme ultraviolet (DUV) region (about 250 nm) and are therefore useful as photoactive compounds in DUV photoresist formulations. |
priorityDate | 1997-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 148.