http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100439534-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-02 |
| filingDate | 2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100439534-B1 |
| titleOfInvention | Leveler for electroplating |
| abstract | The present invention relates to an electroplating composition for fine pattern or microhole plating, the plating composition according to the present invention comprises an alkane, cycloalkane or phenol sulfonic acid or derivative thereof having at least one or more fluorine substituents as a leveler (leveler) It is characterized in that, it is possible to provide a plating film excellent in uniformity in the fine pattern and the fine holes. |
| priorityDate | 2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 46.