http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100431913-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-061 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J27-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J27-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-48 |
| filingDate | 1999-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100431913-B1 |
| titleOfInvention | System and method for in-process cleaning of an ion source |
| abstract | Methods and systems are provided for in-process cleaning of ion source 12. The ion source 12 comprises: (a) a plasma chamber 22 formed by chamber walls 112, 114, and 116 defining a boundary of the ionization region 120; (B) a first mechanism (68) and a source (66) of the ionizable dopant gas for introducing an ionizable dopant gas into the plasma chamber; (C) a second mechanism 184 for introducing a cleaning gas into the plasma chamber and a source 182 of the cleaning gas; And (d) an exciter 130 disposed at least partially within the chamber for applying energy to the ionizable dopant gas and the cleaning gas to produce a plasma in the plasma chamber. The plasma includes a dissociated and ionized composition of the dopant gas and a dissociated and ionized composition of the cleaning gas. The dissociated and ionized composition of the cleaning gas reacts with the dissociated and ionized composition of the dopant gas to prevent deposits of elements contained in the ionizable dopant gas from forming on the surfaces of the chamber walls. do. For example, this cleaning gas is nitrogen trifluoride (NF 3 ) and the ionizable dopant gas may be, for example, phosphine (PH 3 ) or arsine (AsH 3 ). . The mass flow controller controls the ratio of the cleaning gas to the ionizable dopant gas introduced into the plasma chamber, which ratio is greater than 0: 1 and is preferably at least 3: 1. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101202435-B1 |
| priorityDate | 1998-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.