http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100424946-B1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13439 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-30 |
filingDate | 2001-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2004-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2004-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100424946-B1 |
titleOfInvention | Etchant for izo layer and etching method thereof |
abstract | An IZO membrane etching solution including an oxalic acid series, a phosphate series compound, a hydrocarbon series compound, and deionized water is provided. Preferably, from 2 to 8% by weight of the oxalic acid series based on the total weight of the composition; 0.5 to 4% by weight of a phosphate compound; 0.0005 to 0.05% by weight of a hydrocarbon-based compound; And it provides an IZO membrane etching solution comprising deionized water so that the total weight of the composition is 100% by weight. This etching solution has the advantage of reducing the attack of the photoreactive material during the etching process, leaving no residue after etching.n n n In addition, by using the etching solution according to the present invention it is possible to improve the oxalic acid crystallization phenomenon below 0 degrees, which is known as a problem of the conventional IZO etching solution, so that crystals do not precipitate at about -5. Therefore, in the manufacturing process of the display apparatus using an IZO film | membrane, there exists an effect which can improve productivity. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1294294-C |
priorityDate | 2001-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.