Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02194 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02197 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31691 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1254 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8246 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-105 |
filingDate |
2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2003-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2003-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-100408517-B1 |
titleOfInvention |
Manufacturing method for ferroelectric thin film using sol-gel process |
abstract |
The present invention relates to a method for producing a ferroelectric thin film using a sol-gel process. A method of manufacturing a ferroelectric thin film by a sol-gel process, comprising: dissolving a Pb precursor and stabilizing a Ti precursor and a Zr precursor; Preparing a ferroelectric solution by stirring and hydrolyzing the dissolved Pb precursor, the stabilized Ti precursor, and the Zr precursor; Forming the ferroelectric thin film on the substrate to the ferroelectric solution prepared by providing a method for producing a ferroelectric thin film by a sol-gel process, it can increase the stability and durability of the solution for producing a ferroelectric thin film In addition, it is possible to greatly improve the film quality during thin film manufacturing. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100649585-B1 |
priorityDate |
2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |