http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100400489-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D175-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate | 2000-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2003-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100400489-B1 |
| titleOfInvention | Photosensitive thermosetting resin composition for shadow mask with superior etching resistance at high temperature and shadow mask prepared by using the same |
| abstract | The present invention relates to a photocurable photosensitive resin composition for a shadow mask having excellent etching resistance at a high temperature and a shadow mask prepared by using the same, wherein a) pencil hardness is 4H or more and at least one carboxyl group in a molecule, and one acrylic 20 to 80% by weight of a photocurable polycaprolactone modified urethane acrylate oligomer having a royl group or a methacryloyl group, b) a pencil hardness of 3 H or more, a skin irritation index (PII) of 1.0 or less and one or more in the molecule 1 to 70% by weight of the photocurable monomer having acryloyl or methacryloyl group, c) 1 to 15% by weight of photoinitiator, d) 0.01 to 3% by weight of leveling agent, and e) 0.01 to 3% by weight of antifoaming agent. The photocurable photosensitive resin composition for shadow masks which are excellent in etching resistance at high temperature, and the shadow mask manufactured using the same are provided. |
| priorityDate | 2000-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 133.