http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100400297-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F32-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 |
| filingDate | 1998-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100400297-B1 |
| titleOfInvention | Novel Photoresist Crosslinkers and Photoresist Compositions Using Them |
| abstract | The present invention relates to a novel photoresist crosslinking agent suitable for photolithography process using KrF (248 nm), ArF (193 nm), E-beam, ion beam, or EUV light source. A photoresist composition comprising a crosslinking agent made of coalescence is disclosed.n n n <Formula 1>n n n n n n n n Herein, R 1 and R 2 are each C 1-10 main chain or branched-substituted alkyl, R 3 is hydrogen or methyl, and n is an integer selected from 2-5. |
| priorityDate | 1998-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 72.