http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100399876-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34 |
| filingDate | 1996-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2003-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100399876-B1 |
| titleOfInvention | Method for depositing a titanium nitride, tantalum nitride or nitride silicide |
| abstract | The present invention relates to a method for depositing titanium nitride, tantalum nitride or titanium nitride silicide, tantalum nitride silicate, and more particularly to a chemical vapor deposition process. According to the present invention, titanium and / or tantalum nitride or nitride silicides are deposited on a substrate by chemical vapor deposition of titanium and / or tantalum silylamido complexes. |
| priorityDate | 1995-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.