| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S427-103 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 |
| filingDate |
1995-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2003-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100371629-B1 |
| titleOfInvention |
Electron-emitting film and its manufacturing method |
| abstract |
A method of manufacturing the electron emitting film 116 is provided. A substrate 102 and a reaction chamber 103 are provided that will have a temperature and pressure. The temperature and pressure are adjusted to a predetermined temperature and a predetermined pressure. The substrate 102 is located in the reaction chamber 103 and hydrocarbon gas flows into the reaction chamber 103. The plasma is ignited in the reaction chamber 103 to form a tetrahedral compound that assists in the deposition of the electron emitting material 116 on the substrate 102 within the reaction chamber 103. |
| priorityDate |
1994-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |