http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100361797-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07K5-0202 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K38-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2000-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2002-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2002-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100361797-B1 |
| titleOfInvention | Polymer with a pericyclic protective group and resist composition containing the same |
| abstract | The present invention relates to a polymer having at least one pericyclic protective group, such as 2-methyl-2-bicyclo [2,2,1] heptanyl. Resist compositions comprising polymers can be used as chemically strengthened resists and have strong etch resistance. In addition, by using such a resist composition, it is possible to successfully form a fine pattern of 0.1 μm pitch. |
| priorityDate | 2000-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 59.