| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02019
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
1999-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2002-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100354600-B1 |
| titleOfInvention |
Process for treating a semiconductor substrate |
| abstract |
The present invention relates to a method of contacting a deionized water solution containing an acidic substance with a semiconductor substrate. |
| priorityDate |
1998-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |