http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100348434-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-441 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-325 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-68 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
filingDate | 2000-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2002-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2002-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100348434-B1 |
titleOfInvention | Resist remover composition comprising HBM |
abstract | The present invention discloses a resist remover composition used for removing resist in the process of manufacturing semiconductor devices such as integrated circuits, highly integrated circuits, and ultrahigh integrated circuits. 10) to 40% by weight of a) a water-soluble organic amine compound, b) 10 to 60% by weight of a water-soluble polar organic solvent, c) 10 to 30% by weight of water, and d) 0.1 to 10 organic phenolic compound containing two or more hydroxyl groups. In the resist remover composition comprising a weight%, the water-soluble polar organic solvent is 2-hydroxyisobutyric acid methyl ester (HBM), the resist remover composition according to the present invention is a hard bake, dry etching, ashing and / Alternatively, the resist film cured by the ion implantation process and the resist film deteriorated by the metal by-products etched from the metal film of the lower part during the process can be easily removed at a low temperature in a short time, and also Corrosion of metal wiring can be minimized. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040040087-A |
priorityDate | 2000-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 152.