http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100337958-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L59-00 |
| filingDate | 1995-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2002-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2002-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100337958-B1 |
| titleOfInvention | Radiation-sensitive composition |
| abstract | Copolymers (a) such as poly (4-hydroxystyrene-co-styrene), anti-dissolution agents (b) or crosslinkers (b ') such as polyacetals, and radiation that can generate acids when exposed to radiation Chemically amplified radiation containing a compound (c), a radiation sensitive base (d) capable of stabilizing the line width from exposure to baking and a solvent (e) for dissolving components (a) to (d) The composition is capable of satisfactorily realizing fine lines and spaces up to 0.22 μm using, for example, a KrF laser, having excellent heat resistance, corrosion resistance and adhesion to the substrate, and standing waves generated by reflection of the exposed light of the substrate. Can form a low pattern. |
| priorityDate | 1994-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 96.