http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100330636-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G04B37-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1993-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2002-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2002-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100330636-B1 |
| titleOfInvention | Pattern Forming Material |
| abstract | The present invention aims at improving a pattern forming material having a wide range of exposure induction and having a small pattern dimension change with respect to a change in exposure dose, and (A) a compound which generates an acid by irradiating active rays, (B) by irradiation with active rays A compound which produces a base or increases basicity, (C) a compound having at least one bond which can be cleaved using an acid, and / or (D) a compound which is insoluble in water and soluble in an aqueous alkali solution. It relates to a material for pattern formation. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100597029-B1 |
| priorityDate | 1992-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 99.