http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100323831-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1999-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2002-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2002-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100323831-B1 |
| titleOfInvention | Photoresist composition, preparation method thereof and method for forming pattern in semiconductor processing using the same |
| abstract | A positive photoresist composition having improved sensitivity and resolution, a method of manufacturing the same, and a method of forming a pattern using the same are disclosed. The photoresist composition comprises a compound represented by formula (1) and a mixture with a compound represented by formula (2a) or (2b), a positive functional resin, and a solvent. Since the sensitivity and the resolution are excellent, a pattern with an improved profile can be obtained.n n n n n n n n n n n n n n n n n n (In the above formula, R 1 and R 2 and R 3 , R 4 and R 5 may be the same or different, respectively, a hydrogen atom, 1,2-naphthoquinonediazide-4-sulfonyl group, 1,2- Naphthoquinonediazide-5-sulfonyl group or 1,2-naphthoquinonediazide-6-sulfonyl group, which may not be hydrogen atoms at the same time, and may be X 1a , X 1b , X 1c , X 1d , X 2a , X 2b , and X 2c may be the same or different and represent a hydrogen atom or an alkyl group, n 1 and n 2 are 0, 1, 2, or 3 and n 3 represents 1 or 2) |
| priorityDate | 1999-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 119.