http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100321728-B1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-55
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B53-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B69-00
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8246
filingDate 1999-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2002-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100321728-B1
titleOfInvention Method for forming feram by using plasma pulse
abstract BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a ferroelectric memory device capable of preventing the deterioration of the characteristics of a ferroelectric due to plasma in an interlayer insulating layer etching process for forming a capacitor contact. The present invention relates to a time modulated plasma, that is, a plasma pulse. Is used to etch an interlayer insulating film covering the capacitor. As a result, etching with less damage can be performed regardless of the process margin considering plasma properties, prevention of deterioration of ferroelectric properties due to etching, omission or shortening of subsequent recovery heat treatment processes, and a simplified process and a device Can improve the reliability.
priorityDate 1999-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-970077323-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990085671-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758

Total number of triples: 23.