http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100297684-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_154f5a8a983d88f296117dcc92946ab4 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1998-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67153b2319a1cce5fdc43090de471bf2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_348e1f9f5c0f0e577b3eccb3258e9511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a54d74fc4dcf9b49cb607a9da485d0e7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9323bf88d79042e139eac41c62b42e26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da21798c0aff4d0b88f3b2c753a4efc3 |
| publicationDate | 2001-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100297684-B1 |
| titleOfInvention | Photoresist composition material |
| abstract | OBJECT: The present invention provides a photosensitive resin composition containing an N-hydroxymethyl acrylamide polymer or copolymer which is stable in an acid and does not gel even when mixed with a diazo photosensitive agent, and a method for producing the same.n n n Composition: N-hydroxymethyl acrylamide or N-hydroxymethyl acrylamide and dimethyl acrylamide were added to the pure water together with an initiator, dissolved and warmed in a nitrogen atmosphere to react the polymer of N-hydroxymethyl acrylamide or dimethyl acrylamide. A copolymer with is obtained, and a diazo photosensitive agent is added to the polymer or copolymer and stirred and dissolved in pure water to obtain a photosensitive resin composition for phosphor slurry.n n n Effect: Since N-methylacrylamide polymer or copolymer with dimethyl acrylamide of the present invention has acid resistance, it can be mixed with non-chromic diazo photosensitizer without changing physical properties, thereby improving the sensitivity of the phosphor slurry and soil during disposal. Does not cause heavy metal contamination. |
| priorityDate | 1998-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.